Description
Contrast enhancement is a microlithography technique which extends the practical limits of optical lithography systems. This improvement in resolution, depth of focus and reduced interference, allows the fabrication of new and denser integrated circuits without the required capital equipment investment.
Significant benefits of contrast enhancement can be recognized from the following performance features:
- Increase Depth of Focus Latitude
- Reduced Linewidth Change Over Steps
- Extends Resolution Limits
- Generates Vertical Resist Profiles
- Increases Develop/Exposure Latitude
- Reduces Proximity and Interference Effects
- Increased integrity in high aspect ratio features
- Simple/Low defect Process