Additional information
| Film Thickness | 250nm |
|---|---|
| Prebake | 110° X 90 sec |
| Exp. | 40mJ/cm<sup>2</sup> (NSR-S203B, NA = 0.68, σ = 0.75) |
| Mask | 200nm (Line Space = 1/10) |
| Focus | -0.3μm (Best Focus) |
| PEB | 110°C X 90 sec |
| Dev. | 60 sec X 1 puddle (SSFD-179N [TMAH = 1.79%]) |